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                                          最後更新日期：2020年04月30日
　

A. 期刊論文

  1. H.-Y. Chen* and W.-H. Yang, "Chromium nitride thin films prepared using atmospheric pressure plasma process," Thin Solid Films (accepted).

  2. H.-Y. Chen* and W.-H. Yang, "A facile approach for preparing chromium nitride thin films via atmospheric pressure plasma processing," Surface & Coatings Technology (in-press).

    H.-Y. Chen* and P.-C. Chen, "P-type spinel ZnCo2O4 thin films prepared using sol-gel process," Applied Surface Science, 505 (2020/Mar.) 144460.

  3. H.-Y. Chen* and J.-H. Ou,"P-type transparent conductive CuAlO2 thin films prepared using atmospheric pressure plasma annealing," Materials Letters, 228 (2018/Oct.) 81-84.

  4. 歐建宏(J. H. Ou)、陳弘穎(H. Y. Chen)*, "以常壓電漿退火製備CuAlO2薄膜及其特性分析," 金屬熱處理 (2018).

  5. H.-Y. Chen* and S.-H. Yang, "Maghemite thin films prepared using atmospheric-pressure plasma annealing," Journal of Vacuum Science & Technology A, 36 (2018/June) 04F405.

  6. H.-Y. Chen* and J.-H. Chen, "Preparation of p-type CuCo2O4 thin films by sol-gel processing," Materials Letters, 188 (2017/Feb.) 63-65.

  7. H.-Y. Chen*, J.-T. Wu, and C. Huang, "Development of a fast annealing process to prepare transparent conductive Mg-doped CuCrO2 thin films," Thin Solid Films, 605 (2016/April) 180-185.

  8. H.-Y. Chen*, Y.-C. Lin, and J.-S. Lee, "Crednerite-CuMnO2 thin films prepared using atmospheric pressure plasma annealing," Applied Surface Science, 338 (2015/May) 113-119.

  9. H.-Y. Chen* and D.-J. Hsu, "X-ray photoelectron spectroscopy studies the cations valencies and distribution in the crednerite-Cu1.1Mn0.9O2 thin films," Journal of Alloys and Compounds, 598 (2014/June) 23-26. (SCI: NSC 101-2221-E-151-029)

  10. H.-Y. Chen* and J.-R. Fu, "Delafossite-CuFeO2 thin films prepared by atmospheric pressure plasma annealing," Materials Letters, 120 (2014/April) 47-49. (SCI: NSC 101-2221-E-151-029)

  11. H.-Y. Chen* and D.-J. Hsu, "Characterization of crednerite-Cu1.1Mn0.9O2 films prepared using sol-gel processing," Applied Surface Science, 290 (2014/Jan) 161-166. (SCI: NSC 101-2221-E-151-029)

  12. H.-Y. Chen* and G.-W. Fu, "Influences of post-annealing conditions on the formation of delafossite-CuFeO2 thin films," Applied Surface Science, 288 (2014/Jan) 258-264 (SCI: NSC 101-2221-E-151-029).

  13. H.-Y. Chen* and C.-C. Yang, "Transparent p-type Zn-doped CuCrO2 films by sol-gel processing," Surf. Coat. Technol., 231 (2013/Sep) 277–280. (SCI: NSC 98-2221-E-151-024-MY2 & NSC 100-2221-E-151-027)

  14. H.-Y. Chen*, K.-P. Chang, and C.-C. Yang, "Characterization of transparent conductive delafossite-CuCr1-xO2 films," Appl. Surf. Sci., 273 (2013/May) 324-329. (SCI: NSC 100-2221-E-151-027 & NSC 101-2221-E-151-029)

  15. H.-Y. Chen* and K.-P. Chang, "Influence of post-annealing conditions on the formation of delafossite-CuCrO2 films," ECS J. Solid State Sci. Technol. 2 (2013/Jan) 76-80. (NSC 100-2221-E-151-027 & NSC 101-2221-E-151-029)

  16. M.-J. Chen, C.-Y. Wu, Y.-M. Kuo, H.-Y. Chen, C.-H. Tsai*, "Preparation of Cu2O nanowires by thermal oxidation-plasma reduction method," Applied Physics A, 108 (2012) 33-141. (SCI:  NSC 98-2221-E-151-009-MY2 & NSC 99-2622-E-151-011-CC3.)

  17. H.-Y. Chen*, W.-J. Yang and K.-P. Chang, "Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch, Appl. Surf. Sci., 258 (2012) 8775-8779. (SCI: NSC 98-2221-E-151-024-MY2 & NSC 100-2221-E-151-027)

  18. H.-Y. Chen* and J.-H. Wu, “Characterization and optoelectronic properties of sol-gel-derived CuFeO2 thin films,” Thin Solid Films, 520 (2012) 5029-5035. (SCI: NSC 98-2221-E-151-024-MY2 & NSC 100-2221-E-151-027)

  19. H.-Y. Chen* and J.-H. Wu, “Transparent conductive CuFeO2 thin films prepared by sol-gel processing,” Appl. Surf. Sci., 258 (2012) 4844-4847. (SCI: NSC97-2221-E-151-004 & NSC 98-2221-E-151-024-MY2).

  20. H.-Y. Chen* and M.-W. Tsai, “Delafossite-CuAlO2 films prepared by annealing of amorphous Cu–Al–O films at high temperature under controlled atmosphere,” Thin Solid Films, 519 (2011) 5966-5970. (SCI: NSC 97-2216-E-151-004 & 98-2221-E-151-024-MY2)

  21. H.-Y. Chen* and M.-W. Tsai, “Delafossite-CuAlO2 thin films prepared by thermal annealing” J. Nano Res., 13 (2011) 81-86. (EI: NSC 97-2216-E-151-004 & 98-2221-E-151-024-MY2)

  22. H.-Y. Chen*, L.-T. Kuo, W.-Y. Chang, and C.-H. Tsai, “Cuprous oxide films prepared by using a microwave atmospheric pressure plasma torch,” Adv. Mater. Res., 47-50 (2008) 1015-1018. (EI)

  23. S. Han*, H.-Y. Chen, L.-T. Kuo, C.-H. Tsa, "Characterization of cuprous oxide films prepared by post-annealing of cupric oxide using an atmospheric nitrogen pressure plasma torch," Thin Solid Films 517 (2008) 1195-1199.(SCI)

  24. C.H. Tsai*, Y.C. Lin, H.-Y. Chen, P.S. Tsai, “Experimental analysis of characterization of aerosol sediments formed by plasma-induced CS2 destruction processes”, Environ. Eng. Sci., 25 (2008) 821-828. (SCI).

  25. H.-Y. Chen, J.-H. Chen and F.-H. Lu*, “Evaluation of Poisson's ratio and Young's modulus of nitride films by combining grazing incidence X-ray diffraction and laser curvature techniques,” Thin Solid Films, 516 (2007) 345-348. (SCI)

  26. S. Han, H.-Y. Chen, C.-C. Chen, T.-N. Yuan and H.C. Shih*, “Characterization of Ni nanowires after annealing,” Mater. Lett., 61 (2007) 1105. (SCI: NSC 94-2216-E-468-002)

  27. H.-Y. Chen* and F.-H. Lu, “Oxidation Behavior of Chromium Nitride Films,” Thin Solid Films, 515 (2006) 2179-2184. (SCI: NSC 94-2216-E-468-002)

  28. H.-Y. Chen, S. Han, and H.-C. Shih*, “The characterization of aluminum nitride thin films prepared by dual ion beam sputtering,” Surf. Coat. Technol., 200 (2006) 3326-3329. (NSC 94-2216-E-468-002) (SCI: NSC 94-2216-E-468-002)

  29. H.-Y. Chen, S. Han, and H.-C. Shih*, “Argon Ion Beam Voltages Influence the Microstructure of Aluminum Nitride Films in a Dual Ion Beam Sputtering System,” Nuclear Inst. Methods in Physics Research B, 242 (2006) 396-398. (SCI: NSC-94-2216-E-468-002)

  30. H.-Y. Chen* and F.-H. Lu, “Oxidation Behavior of Titanium Nitride Films,” J. Vac. Sci. Technol. A, 23 (2005) 1006-1009. (SCI: NSC 94-2216-E-468-001)

  31. S. Han, H.-Y. Chen, and H.C. Shih*, “Phase transformation in the copper oxide nanowires,” J. Vac. Sci. Technol. B, 23 (2005) 2557-2560. (SCI: NSC 94-2216-E-468-002)

  32. S. Han, H.-Y. Chen, Han C. Shih*, “Argon ion beam voltage in a dual ion beam sputtering system influence on the aluminum nitride films microstructure,” Vacuum, 78 (2005) 539-543. (SCI: NSC 90-2216-E-005-026)

  33. S. Han, H.-Y. Chen, C.-H. Cheng, J.-H. Lin, H.-C. Shih*, “Aluminum Nitride Films Synthesized by Dual Ion Beam Sputtering,” J. Mater. Res, 19 (2004) 3521-3525.

  34. H.-Y. Chen, S. Han, and H.-C. Shih*, "Microstructures and properties changes induced by a metal vapor vacuum arc chromium-interlayer in chromium nitride films," Mater. Lett., 58 (2004) 2924-2926.

  35. H.-Y. Chen, S. Han, C.-H. Cheng, and H.C. Shih, "Effect of Argon Ion Beam Voltages on the Microstructure of Aluminum Nitride Films Prepared at Room Temperature by a Dual Ion Beam Sputtering System," Applied. Surf. Sci., 228 (2004) 128-133.

  36. H.-Y. Chen, C.-J. Tsai, and F.-H. Lu, "The Young's Modulus of Chromium Nitride Films," Surf. Coat. Technol., 184 (2004) 69-73.

  37. S. Han, H.-Y. Chen, K.-L Chang, K.W. Weng, D.-Y. Wang, F.-H. Lu, and H.-C. Shih, "Effect of MEVVA-implanted chromium on the structure and properties of CrN films," Thin Solid Films, 447-448 (2004) 425-429.

  38. S. Han, H.-Y. Chen, J.H. Lin, Z.C. Chang, C.J. Yang, F.-H. Lu, and H.C. Shih, "The Effect of Metal Vapor Vacuum Arc Cr-Implanted Interlayer on the Microstructure of CrN Films on Silicon," Thin Solid Films, 436 (2003) 238-243.

  39. H.-Y. Chen and Fu-Hsing Lu, "Stress Relaxation-Induced Phase Transformation in Chromium Nitride Films," J. Mater. Sci. Lett., 22 (2003) 817-819.

  40. H.-Y. Chen and F.-H. Lu, "Phase Transformation in CrN Films," Mater. Sci. Engr. (in Chinese) 34 (2002) 246-250.

  41. F.-H. Lu, H.-Y. Chen, and C.-H. Hung, "The Degradation of CrN Films at High Temperature under Controlled Atmosphere," J. Vac. Sci. Technol. A, 21 (2003) 671-675.

  42. H.-Y. Chen and F.-H. Lu, "Phase Transformation in Chromium Nitride Films," J. Vac. Sci. Technol. A, 21 (2003) 695-700.

  43. F.-H. Lu and H.-Y. Chen, "Phase Changes of CrN Films Annealed at High Temperature under Controlled Atmosphere,” Thin Solid Films, 398-399 (2001) 368-373.

  44. F.-H. Lu*, S.-P. Feng, H.-Y. Chen, and J.-K. Li, "The Degradation of TiN Films on Cu Substrates at High Temperature under Controlled Atmosphere," Thin Solid Films, 375 (2000) 123-127.

  45. F.-H. Lu* and H.-Y. Chen, "Characterization of Titanium Nitride Films Deposited by Cathodic Arc Plasma Technique on Copper Substrates," Surf. Coat. Technol., 130 (2000) 290-296.

  46. F.-H. Lu* and H.-Y. Chen, "XPS Analyses of TiN Films on Cu Substrates after Annealing in the Controlled Atmosphere," Thin Solid Films, 355-356 (1999) 374-379.

B.  研討會論文

  1. F.-H. Lu and H.-Y. Chen, “XPS Analyses of TiN Films on Cu Substrates after Annealing in the Controlled Atmosphere,” International Conference on Metallurgical Coatings and Thin Films (1999) San Diego, U.S.A.

  2. H.-Y. Chen and F.-H. Lu, “Phase Changes of CrN Films Annealed at High Temperature under Controlled Atmosphere,” International Conference on Metallurgical Coatings and Thin Films (2001) San Diego, U.S.A.

  3. H.-Y. Chen and F.-H. Lu, “Phase Transformation in Chromium Nitride Films,” International Conference on Metallurgical Coatings and Thin Films (2002) San Diego, U.S.A.

  4. S. Han, H.-Y. Chen, K.L. Chang, F.-H. Lu, H.C. Shih, “The Effect of the Microstructure of Chromium Nitride Film with and without an MEVVA Cr-Implanted Interlayers,” International Conference on Metallurgical Coatings and Thin Films (2002) San Diego, U.S.A.

  5. H.-Y. Chen and F.-H. Lu, “Phase Transformation of Chromium Nitride Films in Vacuum” American Vacuum Society (2002) Denver, Colorado, U.S.A.

  6. S. Han, H.-Y. Chen, C.H. Cheng, F.-H. Lu, and H.C. Shih, “The Characterization of AlN Films Deposited by Dual Ion Beam Sputtering System,” International Conference on Metallurgical Coatings and Thin Films (2003) San Diego, U.S.A.

  7. S. Han, H.-Y. Chen, K.L. Chang, F.-H. Lu, H.C. Shih, “The Effect of Annealed Chromium Nitride Film with and without an MEVVA Cr-Implanted Interlayers,” International Conference on Metallurgical Coatings and Thin Films (2003) San Diego, U.S.A.

  8. 陳弘穎、呂福興, “氮化鈦鍍膜在不同氣氛下退火之X光光電能譜分析,” 中國材料科學學會年會 (1998) 台北。

  9. 陳弘穎、李基魁、呂福興, “氧分壓對氮化鈦鍍膜高溫劣化之影響,” 中華民國陶業年會 (1999) 台北。

  10. H.-Y. Chen, J.-K. Li, and F.-H. Lu, “High Temperature Degradation of TiN films on Cu Substrates in Different Atmosphere,” 中華民國鍍膜科技研討會 (1999) 新竹。

  11. H.-Y. Chen and F.-H. Lu, “The Degradation of TiN Films at High Temperature in Different Atmosphere,” 中國材料科學學會年會 (1999) 新竹。

  12. 何詠碩、黃鳳雄、陳弘穎、呂福興, “氮氣中之微量氧對鉻與氮反應的影響,” 中國材料科學學會年會 (2000) 高雄。

  13. 陳弘穎、呂福興, “氮化鉻鍍膜的相變化研究,” 中國材料科學學會年會 (2001) 台中。

  14. 何詠碩、黃鳳雄、陳弘穎、呂福興, “鉻與氮氣在不同氧氣含量下的反應,” 中國材料科學學會年會 (2001) 台中。

  15. 陳弘穎、呂福興, “氮化鉻薄膜之相變化研究,” 中華民國鍍膜科技研討會 (2001) 彰化。

  16. F.-H. Lu, H.-Y. Chen, and C.-H. Hung, “The Degradation of Chromium Nitride Films at High Temperature under Controlled atmosphere,” 中華民國腐蝕學會年會 (2002) 台中。

  17. H.-Y. Chen and F.-H. Lu, “The Young’s Modulus of Chromium Nitride Films,” 中華民國鍍膜科技研討會 (2002) 台南。

  18. 陳弘穎、呂福興, “氮化鉻鍍膜於高溫真空下的相變化,” 中國材料科學學會年會 (2002) 台北。

  19. H.-Y. Chen and F.-H. Lu, “The Phase Transformation of Chromium Nitride Films: Experimental and theoretical Investigation,” 中華民國鍍膜科技研討會 (2003) 新竹。

  20. H.-Y. Chen, S. Han, F.-H. Lu, and H.C. Shih, “The Effect of Metal Vapor Vacuum Arc Cr-Implanted Interlayer on Chromium Nitride Films,” 中華民國鍍膜科技研討會 (2003) 新竹。

  21. H.-Y. Chen, S. Han, F.-H. Lu, and H.C. Shih, “The Influence of Chromium Nitride Films with and without an MEVVA Cr Interlayer,” 中國材料科學學會年會 (2003) 台南。

  22. H.-Y. Chen, F.-H. Lu, and H.-C. Shih, “Oxidation mechanism of titanium nitride films,” 205th Electrochemical Society Meeting (2004) San Antonio, U.S.A.